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DIN 50453-2:1990-10
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DIN 50453-2:1990-10
Testing of materials for semiconductor technology; determination of etch rates of etching mixtures; silicium-dioxid coating; optical methodMore info
The standard defines the test method for the determination of etch rates of etch mixtures on siliciumdioxid coatings.
| Author | DIN |
|---|---|
| Editor | DIN |
| Document type | Standard |
| Format | File |
| Cancellation date | |
| Confirmation date | |
| expiration_de_validite | |
| ICS | 29.045 : Semiconducting materials
|
| Number of pages | 2 |
| Replace | DIN 50453-2 (1989-01) |
| Year | 1990 |
| Document history | DIN 50453-2 (1990-10) |
| Country | Germany |
| Keyword | DIN 50453;50453 |