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DIN 50455-2:1999-11
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DIN 50455-2:1999-11
Testing of materials for semiconductor technology - Methods for the characterisation photoresists - Part 2: Determination of photosensitivity of positive photoresistsMore info
The method according to the document covers the characterization of photoresists by comparison of the determined photosensitivity of a single-layer positive photoresist on silicon wafers with a reference photoresist.
| Author | DIN |
|---|---|
| Editor | DIN |
| Document type | Standard |
| Format | File |
| ICS | 29.045 : Semiconducting materials
|
| Number of pages | 4 |
| Replace | DIN 50455-2 (1998-07) |
| Year | 1990 |
| Document history | DIN 50455-2 (1999-11) |
| Country | Germany |
| Keyword | DIN 50455;50455 |