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DIN 50455-1:2009-10
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DIN 50455-1:2009-10
Testing of materials for semiconductor technology - Methods for characterizing photoresists - Part 1: Determination of coating thickness with optical methodsMore info
This document specifies methods for characterizing photoresists by determining of coating thickness of photoresists prepared under conditions specified in this document. The coating procedure is applicable to silicon slices with diameters of 100 mm to 200 mm. Use on other substrates or slice diameters is possible in principle if each case was tested.
| Author | DIN |
|---|---|
| Editor | DIN |
| Document type | Standard |
| Format | File |
| ICS | 29.045 : Semiconducting materials
|
| Number of pages | 8 |
| Replace | DIN 50455-1 (1991-06) |
| Year | 2009 |
| Document history | DIN 50455-1 (2009-10) |
| Country | Germany |
| Keyword | DIN 50455;50455 |