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This standard specifies methods of determining nitric acid for traces of Al, As, Ba, Be, Bi, Ca, Cd, Co, Cr, Cu, Fe, Ga, Ge, Hf, In, K, Li, Mg, Mn, Mo, Ni, Nb, Pb, Sb, Sn, Sr, Ta, Ti, V, Zn und Zr, which are all relevant for semi-conductor technology. The method involves inductively coupled plasma mass spectrometry (ICP MS). The methods described are valid for metal trace mass fractions of 100 ng/kg to 10000 ng/kg. The evaporation method as specified in 5.3 is also applicable to other evaporable liquids, provided the recovery rate of the analytes is between 70 % and 130 %. This standard may also be used for determining other elements provided the statistical characteristics determined for these elements comply with the requirements specified in Clause 12.
| Author | DIN |
|---|---|
| Editor | DIN |
| Document type | Standard |
| Format | File |
| ICS | 29.045 : Semiconducting materials
|
| Number of pages | 19 |
| Replace | DIN 50451-3 (2003-04) |
| Year | 2014 |
| Document history | DIN 50451-3 (2014-11) |
| Country | Germany |
| Keyword | DIN 50451;50451 |