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DIN 50451-3:2014-11

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DIN 50451-3:2014-11

Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 3: Determination of 31 elements in high-purity nitric acid by ICP-MS

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This standard specifies methods of determining nitric acid for traces of Al, As, Ba, Be, Bi, Ca, Cd, Co, Cr, Cu, Fe, Ga, Ge, Hf, In, K, Li, Mg, Mn, Mo, Ni, Nb, Pb, Sb, Sn, Sr, Ta, Ti, V, Zn und Zr, which are all relevant for semi-conductor technology. The method involves inductively coupled plasma mass spectrometry (ICP MS). The methods described are valid for metal trace mass fractions of 100 ng/kg to 10000 ng/kg. The evaporation method as specified in 5.3 is also applicable to other evaporable liquids, provided the recovery rate of the analytes is between 70 % and 130 %. This standard may also be used for determining other elements provided the statistical characteristics determined for these elements comply with the requirements specified in Clause 12.

Author DIN
Editor DIN
Document type Standard
Format File
ICS 29.045 : Semiconducting materials
Number of pages 19
Replace DIN 50451-3 (2003-04)
Year 2014
Document history DIN 50451-3 (2014-11)
Country Germany
Keyword DIN 50451;50451